KMID : 1039220160260020119
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Journal of Korean Society of Occupational and Environmental Hygiene 2016 Volume.26 No. 2 p.119 ~ p.138
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Size, Shape, and Crystal Structure-dependent Toxicity of Major Metal Oxide Particles Generated as Byproducts in Semiconductor Fabrication Facility
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Choi Kwang-Min
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Abstract
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Objectives: The purpose of this study is to review size, shape, and crystal structure-dependent toxicity of major metal oxide particles such as silicon dioxide, tungsten trioxide, aluminum oxide, and titanium dioxide as byproducts generated in semiconductor fabrication facility.
Methods: To review the toxicity of major metal oxide particles, we used various reported research and review papers. The papers were searched by using websites such as Google Scholar and PubMed. Keyword search terms included ¡®SiO2(or WO3 or Al2O3 or TiO2) toxicity¡¯, ¡®health effects SiO2(or WO3 or Al2O3 or TiO2). Additional papers were identified in references cited in the searched papers.
Results: In various cell lines and organs of human and animals, cytotoxicity, genotoxicity, hepatoxicity, fetotoxicity,
neurotoxicity, and histopathological changes were induced by silicon dioxide, tungsten trioxide, aluminium oxide, and titanium dioxide particles. Differences in toxicity were dependent on the cell lines, organs, doses, as well as the chemical composition, size, surface area, shape, and crystal structure of the particles. However, the doses used in the reported papers were higher than the possible exposure level in general work environment. Oxidative stress induced by the metal oxide particles plays a significant role in the expression of toxicity.
Conclusions: The results cannot guarantee human toxicity of the metal oxide particles, because there is still a lack of available information about health effects on humans. In addition, toxicological studies under the exposure conditions in the actual work environment are needed.
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KEYWORD
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aluminum oxide, process byproduct, semiconductor facility, silicon dioxide, titanium dioxide, tungsten trioxide
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